Autori: Novkovski N
Naslov | Stress-induced leakage currents in thin silicon dioxide films (Article) |
Autori | Pesic Biljana Vracar Ljubomir M Stojadinovic Ninoslav D Pecovska-Djordjevic M Novkovski N |
Info | JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS, (2003), vol. 14 br. 10-12, str. 805-807 |
Ispravka | Web of Science Članak Elečas Rang časopisa Citati: Web of Science |
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